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Lam Research Corp. Introduces Dielectric Atomic Layer Etching Capability for Advanced Logic
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Atomic layer etching (ALE) offers chipmakers more than just the precise removal of targeted material — etching both directionally (in one direction) or isotopically (in all directions). Furthermore, features with different aspect ratios can be etched the same amount, minimizing or eliminating aspect ratio dependent etching (ARDE). We power ALE with products like Flex®. https://bit.ly/4lju9qx | Lam Research Corporation
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Atomic layer etching (ALE) offers chipmakers more than just the precise removal of targeted material — etching both directionally (in one direction) or isotopically (in all directions). Furthermore, features with different aspect ratios can be etched the same amount, minimizing or eliminating aspect ratio dependent etching (ARDE). We power ALE with products like Flex®. https://bit.ly/4lju9qx | Lam Research Corporation
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Step inside of a wafer to see how our tools tackle bonding, dicing, etching, and deposition with the precision needed to shrink gaps, smooth interfaces, and strengthen every layer. The advanced packaging era is here — take a closer look. | Lam Research Corporation
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Our cryogenic dielectric etch technology—Lam Cryo 3.0—delivers enhanced etch rates, vertical high aspect ratio (HAR) profiles, and more. Learn how Lam Cryo 3.0 is optimized to manufacture next-generation 3D NAND devices with 400 layers and beyond from Group VP and GM of Etch Product Group, Harmeet Singh. https://bit.ly/3yCkBVv | Lam Research Corporation
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