Demand for high power devices is increasing in several electronics applications, including automotive, industrial, data center, and energy industries. Today, power devices have to meet stringent ...

Silicon nitride etch has been one of the foundations of semiconductor manufacturing for a number of years. Overall silicon (Si) etch rate is dictated by the combination of process temperature and H 2 ...

Lam Research LRCX has rolled out a etch solution, namely Syndion GP, in order to expand its reach to the semiconductor industry. Notably, the solution, which is backed by Lam Research’s deep silicon ...

SANTA CLARA, Calif.–Applied Materials Inc. today announced a new silicon etch chamber for 200- and 300-mm wafer DRAM fabs needing deep-trench etching technology for 100-nm and below process geometries ...

German scientists have investigated the role of surface texturing in perovskite-silicon tandem cells and have found that several new processes offer the ability to etch smaller, more uniform textures ...

Fabrication of 3D NAND devices involves a challenging and complex deposition and etch process. Two etch processes have been identified as substantially impacting 3D NAND product yields: silicon ...

Suppliers of power semiconductors continue to develop and ship devices based on traditional silicon technology, but silicon is nearing its limits and faces increased competition from technologies like ...

After nearly a decade and five major nodes, along with a slew of half-nodes, the semiconductor manufacturing industry will begin transitioning from finFETs to gate-all-around stacked nanosheet ...

In circuitry, etching is used to remove the deformed layer created during the grinding and polishing of metal components by selective chemical attack. Now, a research group at Nagoya University in ...

As semiconductor scaling pushes beyond 3 nm, backside power-delivery networks become essential to ease wiring congestion. A ...