The semiconductor industry thrives on precision and innovation, as every nanometer can make the difference between groundbreaking performance and obsolescence. In this hyper-competitive landscape, ...

After more than a decade of research and development, Tokyo Electron Miyagi Ltd. has introduced an innovative semiconductor etching method that achieves etch rates up to five times faster than ...

After more than a decade of research and development, Tokyo Electron Miyagi Ltd. has introduced an innovative semiconductor etching method that achieves etch rates up to five times faster than ...

In this interview, AZoM talks to Bas Derksema about advancements in plasma etching and deposition processes for compound semiconductor materials applications. Please could you introduce yourself and ...

Copper’s resistivity depends on its crystal structure, void volume, grain boundaries and material interface mismatch, which becomes more significant at smaller scales. The formation of copper (Cu) ...

In circuitry, etching is used to remove the deformed layer created during the grinding and polishing of metal components by selective chemical attack. Now, a research group at Nagoya University in ...

Plasma etching has become the cornerstone of modern semiconductor fabrication, offering unparalleled precision in the removal of material from silicon, compound semiconductors and dielectric films. By ...

Standard electronic design automation (EDA) tools can be used to produce a semiconductor layout, which can be used to manufacture a device with targeted performance specifications. Unfortunately, ...

AlixLabs, the Lund-based semiconductor process startup developing Atomic Pitch Splitting (APS™), has completed its €15M Series A with a strategic top-up from Finnish investor Stephen Industries. The ...

Companies to Focus on Patterning for Leading-Edge Chips, Including Dry Resist for EUV Lithography, Next Generation MaterialsTOKYO, Sept 16, 2025 - (JCN Newswire) - JSR Corporation, a leading technolog ...