After more than a decade of research and development, Tokyo Electron Miyagi Ltd. has introduced an innovative semiconductor etching method that achieves etch rates up to five times faster than ...

Development of next-generation power devices is needed for energy saving in a low carbon society. Diamond is a potentially important power device material due to its excellent physical and electronic ...

Ion beam expertise is critical to delivering the manufacturing tolerance required for these gratings. Oxford Instruments Plasma Technology has developed a technology to allow optical designers to ...

A team of physicists has uncovered some of the physics that make possible the etching of silicon computer chips, which power cell phones, computers, and a huge range of electronic devices. Physicist ...

An example of directional etching for nanohole arrays of less than 500nm in diameter. (Image: A*STAR Institute of Materials Research and Engineering) Wet etching can be classified into two main types ...

For maximum resolution in a scanning tunneling microscope (STM), an extremely sharp metallic tip is required, which serves as the point through which the STM “scans” a sample. A blunt tip reduces STM ...

A new approach combining atomic layer deposition and organic film etch process may solve critical challenges in the various processes in advanced nodes. We demonstrated a high selective and ...

As any good metallurgist will tell you, you can't just take any two types of metal and weld them together. You may instead be able to just join them together with glue, however, thanks to research ...