Advancing development of EUV photomasks for IBM's 2 nanometer technology designs TOKYO, Feb. 6, 2024 /PRNewswire/ -- Toppan Photomask, the world's premier semiconductor photomask provider, announced ...

TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP) (TOKYO: 7912) has successfully developed a photomask manufacturing process capable of accommodating the 3-nanometer (10-9 meter) lithography ...

TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has begun development of a photomask manufacturing for 2-nanometer (10-9 meter) generation logic semiconductors that support ...

Industry sources stated that Samsung has signed equipment contracts and placed orders for extreme ultraviolet (EUV) photomask pellicle-related equipment for its Taylor fab with South Korean equipment ...

The eBeam Initiative conducted its 14 th annual eBeam Initiative Luminaries survey in July and reported the results on September 23, 2025 to more than 200 attendees at its annual meeting during the ...

(RTTNews) - Toppan Photomask said that it has reached a joint research and development agreement with IBM related to the 2 nanometer or nm logic semiconductor node, using extreme ultraviolet (EUV) ...