KYOTO, Japan--(BUSINESS WIRE)--On April 20, 2018, SCREEN Semiconductor Solutions Co., Ltd. (SCREEN) signed a memorandum of understanding (MoU) with National Tsing Hua University (NTHU) in a ceremony ...
After more than a decade of research and development, Tokyo Electron Miyagi Ltd. has introduced an innovative semiconductor etching method that achieves etch rates up to five times faster than ...
New platform for semiconductor inspection and metrology developed through joint research by Photo electron Soul and Nagoya University begins validation at KIOXIA Iwate NAGOYA, Japan — In late ...
Focuslight Technologies Inc., a photonics application solution provider, has announced Flux H Series - a variable beam laser system for pan-semiconductor manufacturing processes. The application of ...
Extreme ultraviolet (EUV) lithography exposed resist patterns can exhibit excessive line edge roughness (LER) and line width roughness (LWR) due to random or shot noise. Increasing the EUV exposure ...
Copper’s resistivity depends on its crystal structure, void volume, grain boundaries and material interface mismatch, which becomes more significant at smaller scales. The formation of copper (Cu) ...
Semiconductors are a crucial element of electronic equipment, allowing for advancements in telecommunications, computers, biotechnology, weapons technology, aviation, renewable energy, and a variety ...
In this interview, AZoM talks to Bas Derksema about advancements in plasma etching and deposition processes for compound semiconductor materials applications. Please could you introduce yourself and ...
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